SEM Specs

MIRA3 XMU SPECIFICATIONS

High Performance FESEM

  • A high brightness Schottky emitter for high-resolution/ high-current/low-noise imaging
  • A powerful In-Beam Detector for high resolution imaging especially at low accelerating voltages

Unique Electron Optics

  • A unique three-lens Wide Field Optics™ design offers a variety of working and displaying modes.
  • The proprietary Intermediate Lens (IML) that works as an „Aperture Changer“ makes the exchange of the effective final aperture in an electromagnetic way.
  • The column construction, without any mechanical centering elements, allows fully automated column set-up and alignment
  • Real time In-Flight Beam Tracing™  for the performance and beam optimization integrating the well established software Electron Optical Design. It includes also direct and continual control of beam spot size and beam current
  • Unique live stereoscopic imaging an 3D surface recontruction utilizing the 3D Beam technology
  • Fast imaging rate up to 20 ns/pixel

Analytical Potential

  • An extra large chamber is able to accommodate specimens with the diameter of about 250 mm
  • A robust 5-axis motorized stage is capable of holding large and heavy samples
  • 12+ chamber interface ports with optimized analytical geometry for EDX and EBSD
  • Fast imaging rates due to first class YAG-based detectors
  • A comprehensive range of optional detectors and accessories
  • 3D measurements on a reconstructed surface utilising the 3D metrology software
  • Integrated pneumatic or optional active vibration isolation for ambient vibration reduction

Automated Analysis

  • The fast and accurate computer controlled stage is suitable for different applications in automated analysis
  • Comunication with external software or  third party products via TCP/IP interface (e.g. automated EDX analysis)
  • High-throughput large-area automation, e.g. automated particle location and analysis

Sophisticated Control

  • A fully automated microscope set-up including electron optics set-up and alignment
  • Sophisticated software for SEM control, image acquisition, archiving, processing and analysis
  • Multi-user environment localized in many languages
  • Three levels of user rights, including an EasySEM™ mode for inexperienced users
  • Built-in image management and report creation
  • Network operations and built-in remote access/diagnostics
  • System built in self-diagnostics

A variable pressure variant that supplements all the advantages of the high vacuum model with extended facility for low vacuum operations. This allows investigation of non-conductive materials in their natural uncoated state.

SEM Column
Electron Gun High brightness Schottky Emitter
Resolution (In-Beam SE) 1.0 nm at 30 kV
2.0 nm at 3 kV
Resolution (SE-ET) 1.2 nm at 30kV
2.5 nm at 3 kV
Resolution in high/low vacuum mode (BSE) 2.0 nm at 30 kV
Magnification 2x – 1,000,000x
Accelerating Voltage 200 V to 30 kV
Probe Current 2 pA to 100 nA
Chamber
Internal dimensions 300 mm (width) x 330 mm (depth)
Door 280 mm (width) x 310 mm (height)
Number of ports 12+
Chamber suspension pneumatic or optionally
active vibration isolation
Working Vacuum
Gun Vacuum < 3 x 10 -7 Pa
Chamber Vacuum – High vacuum mode < 9 × 10-3 Pa
Chamber – Low Vacuum Mode (XMU) 7–150 Pa
Stage
Type compucentric
Movements Fully motorized:
X = 130 mm
Y = 130 mm
Z = 100 mm
Rotation: 360˚ continuous
Tilt: -30˚ to +90˚
Specimen height maximum 145 mm

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